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Haohai hlau Meterials Co., Ltd.

Haohai Titanium Co., Ltd.


Chaw nyob:

PlantNo.19, TusPark, CenturyAvenue,

XianyangCity, ShaanxiPro., 712000, Suav teb


TEL:

+86 29 3358 2330

+86 29 3358 2349


Fax:

+86 29 3315 9049


E-mail:

INFO@pvdtarget.com

Sales@pvdtarget.com



Qhov kev pab tus xov tooj neeg
029 3358 2330

Xov xwm

Tsev > Xov xwmNtsiab lus

Hlau Phom Hlab Hom Phem Feem Ntau Ntawm Cov Ntawv

Cov tshuaj uas yuav tsum tau yog cov ntau dua cov khoom ntawm cov tshuaj. Tej yam yuav tsum tau ua xws li loj, thaj, purity, cov ntsiab lus tsis sib xws, qhov ceev, N / O / C / S, grain loj thiab defect tswj; Cov kev xav tau siab dua los yog tshwj xeeb yuav tsum muaj xws li: qhov chaw npau taws, ua haujlwm tsis zoo, tsis muaj kev sib npaug, sib sau ua ke thiab koom ua ke, txawv teb chaws (oxide) cov ntsiab lus thiab loj, permeability, ultra-high density thiab ultra-fine grain thiab thiaj li. Magnetron sputtering yog ib yam tshiab ntawm lub cev muaj zog vapor uas siv cov tshuab hluav taws xob tshuab electronically emit thiab ua kom pom tseeb ntawm cov khoom ua plated kom lub qhov ntais uas ntiav ua raws li lub zog ntawm lub zog ua zog nrog lub siab dua qhov zog ntawm cov khoom Ya mus rau cov duab substrate. Cov khoom siv plated no yog hu ua sputtering target. Sputtering lub hom phaj yog cov hlau, cov hlau ntoo, ceramics, borides thiab cov zoo li.

Sputtering yog ib qho ntawm cov tswv yim tseem ceeb rau kev npaj cov ntaub ntawv nyias nyias. Nws siv ion generated los ntawm ion los mus ua kom lub pob aggregation hauv lub tshuab nqus tsev kom ua tau siab tshaj tawm txoj kab xo loj, npau taws cov khoom ntws, pauv kev sib txeeb ntawm cov ions thiab cov khoom ntom ntom ntom ntom, Qhov ntawd yog qhov atoms ntawm cov khoom ntws tawm ntawm cov khoom thiab tso rau ntawm qhov saum npoo ntawm lub substrate, lub bombardment ntawm lub khoom yog sputtering txoj ntawm deposition ntawm nyias zaj duab xis ntawm raw cov ntaub ntawv, lub npe hu ua sputtering lub hom phiaj. Muaj ntau hom kev siv luam yeeb yaj kiab nyias siv tau hauv cov khoom siv hluav taws xob, cov ntaub ntawv xov xwm, kev qhia ncaj, thiab cov txheej txheem ntim.

Lub hom phiaj ntawm kev siv tshuaj tua kab mob yog siv hauv hluav taws xob thiab kev lag luam, xws li kev sib cog ua ke, cov ntaub ntawv cia, kua tshuaj siv ua kua, laser nco, electronic control devices, etc .; tuaj yeem siv tau nyob rau hauv thaj tsam ntawm iav txheej; tuaj yeem siv tau rau cov khoom siv tawv ntoo-resistant,, Cov khoom siv ua kom zoo nkauj thiab lwm yam lag luam.

kev faib tawm

Magnetron pluttering txujci: nyob rau hauv lub plhu (cathode) thiab qhov anode nruab nrab ntawm ib thaj tsam orthogonal magnetic thiab ib qho hluav taws xob, nyob rau hauv lub tshuab nqus tsev uas muaj lub tshuab nqus tsev (feem ntau Ar roj), daim nplaum magnet hauv lub hom phiaj cov khoom siv los ua ib qho chaw magnetic ntawm 250 ~ 350 Gaussian, nrog lub siab muaj zog hluav taws xob uas muaj thaj tsam ntawm electrostetic orthogonal. Nyob rau hauv qhov kev txiav txim ntawm cov hluav taws xob, Ar roj ionization ua zoo ions thiab electrons, lub phiaj xwm nrog rau tej yam tsis zoo siab, cov electrons tawm ntawm lub phiaj xwm los ntawm magnetic teb thiab lub luag hauj lwm ntawm txoj hauj lwm ntawm ionization ntau ntxiv nce nyob ze ntawm lub cathode los tsim ib lub siab ntawm cov ntshav siab, Ar ions nyob rau hauv lub luag hauj lwm ntawm Lorentz yuam kom ceev cov davhlau mus rau lub hom phiaj, ntawm kev kub ceev ntawm lub phiaj nto, yog li hais tias lub tshuab qwj nplais ntawm lub cev ua raws li lub caij hloov siab ntev nrog lub siab zog ntawm lub hom phiaj ntawm lub hom phiaj Lub substrate tso thiab tso. Magnetron pluttering yog feem ntau muab faib ua ob hom: kev sib zog sib nqus thiab Sputtering, uas yog cov khoom siv sib txig sib txuas yooj yooj yim, nyob rau hauv lub tshuab tawg hlau, nws tus nqi tseem ceev heev. Kev siv cov tshuaj Sputtering RF muaj ntau dua, ntxiv rau cov khoom siv sib txuas lus, tabsis kuj tseem siv cov ntaub ntawv uas tsis yog cov khoom siv, thaum Lub Chaw Ua Haujlwm ntawm cov tshuaj oxide, nitrides thiab carbides thiab lwm cov tshuaj. Yog tias qhov Freedom Freedom nce tom qab ua ib qho microwave plasma sputtering, feem ntau siv hluav taws xob cyclotron resonance (ECR) hom microwave plasma sputtering.

Magnetron pluttering lub hom phiaj:

Hlau phom hom phiaj, hlau phom hom phiaj, lub plhaub phom txoj hlua, lub plhaub phom txoj hlua khi, lub plhaub phom ntawm lub plhaws, cov tshuaj hu ua ceramic sputtering target, lwm yam phiajcim ceramic, chrome-doped Silicon ceramic phiaj (Cr-SiO), indium phosphate target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).