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Haohai hlau Meterials Co., Ltd.

Haohai Titanium Co., Ltd.


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PlantNo.19, TusPark, CenturyAvenue,

XianyangCity, ShaanxiPro., 712000, Suav teb


TEL:

+86 29 3358 2330

+86 29 3358 2349


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+86 29 3315 9049


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029 3358 2330

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Tsev > Xov xwmNtsiab lus

Chrome Sputtering Target Ntawm Lub inert Gas

Chrome sputtering phiaj

1) Chrome sputtering phiaj hauv paus ntsiab lus:

Ib orthorhombic magnetic teb thiab ib tug hluav taws xob field yog siv ntawm lub sputtering phiaj (cathode) thiab cov anode, thiab yuav tsum tau inert roj (feem ntau yog Ar gas) yog them nyob rau hauv lub siab lub tshuab nqus tsev chamber. Mus tas li magnet ntaub ntawv 250 mus rau 350 rau ntawm qhov chaw ntawm lub hom phiaj cov ntaub ntawv uas Gaussian magnetic teb, nrog rau cov high voltage fais teb muaj li ntawm orthogonal electromagnetic teb. Nyob rau hauv qhov kev txiav txim ntawm lub electric teb, Ar pa roj yog ionized rau hauv zoo ions thiab electrons, lub hom phiaj yog ntxiv nrog ib tug tej yam tsis zoo siab, cov electrons tawm txim liab los ntawm lub hom phiaj yog cuam tshuam los ntawm lub magnetic teb thiab lub ionization yuav tshwm ntawm cov ua hauj lwm cov pa roj nce , txoj kev ua ib siab ceev ntshav nyob rau hauv lub cheeb tsam ntawm lub cathode lub cev, Ar ions nyob rau hauv lub luag hauj lwm ntawm Lorentz quab yuam rau accelerate lub davhlau mus rau lub hom phiaj nto, nyob ib kev kub ceev bombardment ntawm lub hom phiaj nto, yog li ntawd lub sputtering ntawm lub hom phiaj atoms ua raws li lub zog hloov dua siab tshiab ntsiab cai nrog ib tug high school cov kev tig tau lub zog los ntawm lub hom phiaj ya lub substrate yog tso thiab tso. Magnetron sputtering yog feem ntau muab faib mus rau hauv ob hom: DC sputtering thiab RF sputtering, DC txaws ntaus ntawv uas yog yooj yim nyob rau hauv tus, nyob rau hauv lub sputtering ntawm hlau, nws tus nqi yog tseem ceev ceev. Kev siv cov RF sputtering yog ntau uas nws kim heev, nyob rau hauv tas li ntawd mus sputtering conductive khoom, tab sis kuj sputtering uas tsis yog-conductive cov ntaub ntawv, tab sis kuj yuav ua tau reactive sputtering kev npaj ntawm oxides, nitrides thiab carbides thiab lwm yam sib txuas. Yog hais tias lub zaus ntawm lub xov tooj cua zaus tom qab lub microwave ntshav sputtering, thiab tam sim no, feem ntau siv hluav taws xob cyclotron resonance (ECR) ntaus microwave ntshav sputtering.

2) Chrome sputtering phiaj hom:

Hlau sputtering txheej phiaj, hlau sputtering txheej phiaj, tej hub sputtering txheej phiaj, boride tej hub sputtering lub hom phiaj, carbide tej hub sputtering phiaj, fluoride tej hub sputtering lub hom phiaj, nitride tej hub sputtering Target, oxide tej hub phiaj, selenide tej hub sputtering lub hom phiaj, silicide tej hub sputtering lub hom phiaj, sulfide tej hub sputtering lub hom phiaj, telluride tej hub sputtering lub hom phiaj, lwm yam tej hub phiaj, chrome-doped Silicon tej hub phiaj (Kr-SiO), indium phosphide phiaj (InP), ua arsenide phiaj (PbAs), indium arsenide phiaj (InAs).